The batch growth of wafer-scale NC-NbSe₂ films. (A) Schematic illustration of the two-step vapor deposition growth that involves a magnetron sputtering of Nb film and a subsequential selenylation into NC-NbSe₂ film in a continuous preparation route. (B, C) Photographs and (D) optical microscopic image of as-grown NC-NbSe₂ film on 4-inch SiO₂/Si substrates. Notably, the SiO₂ substrate was artificially exposed for visual guidance. (E) The representative Raman spectra of NC-NbSe₂ film. The inset shows the characteristic Raman stretching modes of A_1g and ${\text{E}}_{2\text{g}}^1$ of NbSe₂. (F) AFM image and the corresponding height profile of NC-NbSe₂ films directly grown on SiO₂/Si. (G) Atomic structure model and (H) the ADF-STEM image of bilayer NC-NbSe₂ film.