Table 6
The materials, preparation method, thickness, area-specific capacitance, energy density, and power density of SC reported in the literatures
Materials | Preparation method | Thickness | Area-specific capacitance | Energy density | Power density | Year | Ref. |
Nanoporous gold/MnO | Magnetron sputtering and electro-deposition | 100 nm | 14 F cm−2 | 55 μWh cm−3 | 3.4 W cm−3 | 2015 | [268] |
Porous silicon/titanium nitride | ALD | 6 μm | 15 F cm−2 | 1.3 mWh cm−3 | 214 W cm−3 | 2016 | [266] |
CNT/graphene | Laser direct writing and plasma processing | 156 μm | 31.9 mF cm−2 | 0.51 mWh cm−3 | 62.8 W cm−3 | 2016 | [267] |
SiC | Anodizing and electrochemical etching | 40 μm | 20 mF cm−2 | 5.24 μWh cm−2 | 11.2 mW cm−2 | 2019 | [244] |
TiN/Al2O3 | ALD | ‒ | 1 μF mm−2 | 1.7 μWh cm−2 | 66 W cm−2 | 2020 | [270] |
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