Table 6

The materials, preparation method, thickness, area-specific capacitance, energy density, and power density of SC reported in the literatures

Materials Preparation method Thickness Area-specific capacitance Energy density Power density Year Ref.
Nanoporous gold/MnO Magnetron sputtering and electro-deposition 100 nm 14 F cm−2 55 μWh cm−3 3.4 W cm−3 2015 [268]
Porous silicon/titanium nitride ALD 6 μm 15 F cm−2 1.3 mWh cm−3 214 W cm−3 2016 [266]
CNT/graphene Laser direct writing and plasma processing 156 μm 31.9 mF cm−2 0.51 mWh cm−3 62.8 W cm−3 2016 [267]
SiC Anodizing and electrochemical etching 40 μm 20 mF cm−2 5.24 μWh cm−2 11.2 mW cm−2 2019 [244]
TiN/Al2O3 ALD 1 μF mm−2 1.7 μWh cm−2 66 W cm−2 2020 [270]

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